AIP Publishing
Browse

Supplement Number 1

Download (1.02 MB)
media
posted on 2025-05-02, 12:08 authored by Samuel Johnson, Jianping Zhao, Tsung-Hsuan Yang, Toshihiko Iwao, Charles Schlechte, John Carroll, Gabriel Blankemeyer, Peter Ventzek, Joaquin Resasco, Gyeong Hwang, John Ekerdt
Plasma Enhanced Atomic Layer Deposition of Silicon Carbonitride using a Single Source Precursor and Different Plasmas

History

Usage metrics

    JVST A: Vacuum, Surfaces, and Films

    Categories

    Keywords

    Atomic Layer DepositionPlasma EnhancedSilicon Carbonitride

    Licence

    CC0

    Exports

    RefWorks
    BibTeX
    Ref. manager
    Endnote
    DataCite
    NLM
    DC