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Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nano-patterning

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posted on 2024-11-04, 14:03 authored by Yasser Pordeli, Céline Steenge, Erwin Berenschot, Ray Hueting, Andrea Migliorini, Stuart Parkin, Niels Tas
Details on the iterative process of vertically stacked nanowedges

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    JVST B: Nanotechnology and Microelectronics

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