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posted on 2024-09-09, 04:08 authored by Lanxin Guo, Yixian Wang, Zifan Pang, Xin Han, Yafeng Wang, Lipei Peng, Xin Gao, Chunlei Pei, Tuo Wang, Jinlong Gong

SI for Examination of Non-Ideal Film Growth in Batch Atomic Layer Deposition for Plasma Resistant Coatings

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Atomic layer deposition Thin film Etch resistant

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