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https://doi.org/10.60893/figshare.apl.29378111
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posted on 2025-07-08, 12:05
authored by
Haris Abbasi
,
Hadeel Alamoudi
,
Tien Ng
,
Vijay Kumar Gudelli
,
Ranveer Singh
,
Jiarui Gong
,
Jie Zhou
,
Yi Lu
,
Yang Liu
,
Dong Liu
,
Shuoyang Qiu
,
Boon S. Ooi
,
Iman S. Roqan
,
Zhenqiang Ma
Detailed discussion on SRV and DFT calculations
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DOI -
Is supplement to
<strong>Investigation of Ultrathin Surface Passivation Layers for GaN: A Comparative Analysis of Al<sub>2</sub>O<sub>3</sub>, SiO<sub>2</sub>, and SiN<sub>x</sub> in Reducing Surface Recombination</strong>
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Categories
Physical sciences
Keywords
Ultrathin passivation layers
Surface recombination velocity (SRV)
Atomic layer deposition (ALD)
GaN heterojunctions
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CC BY 4.0
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