posted on 2025-03-04, 13:06authored byKyungmin Yoo, Youngchan Kim, Seo Kyung Park, Sungho Park, Jeseung Lee
The supplementary material includes schematic diagrams and photograph of the equipment, data on deposited pGMA (SEM images, XPS, and FT-IR spectra) and Al2O3 (SEM images and EDS spectra) films, process sequence and thickness comparisons of thermal ALD and PE-ALD, and film uniformity data on deposited pGMA and Al2O3 thin films.