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Supplemental Information for Effects of process parameters on FE of HZO.pdf (894.52 kB)

Supplementary material

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posted on 2024-03-22, 11:55 authored by Guillermo A. Salcedo, Ahmad E. Islam, Elizabeth Reichley, Michael Dietz, Christine M. Schubert-Kabban, Kevin D. Leedy, Tyson C. Back, Weisong Wang, Timothy Wolfe, James M. Sattler
The supplementary material contains images, diagrams, and tables with information for the metal-ferroelectric-metal (MFM) devices fabricated. It also contains details about the characterization of the samples, including X-ray photo spectroscopy (XPS), ellipsometry and polarization-electric field (P-E) testing. The remaining material contains descriptive statistics for the remanent polarization (Pr) values measured, additional details about the analysis of variance (ANOVA), and a more detailed description of the Pr model along with verification of model underlying assumptions.

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