Supplementary Online Material

https://doi.org/10.60893/figshare.jap.24999731

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posted on 2024-02-01, 12:55 authored by AIP AdminAIP Admin, X. C. Chen, L. Li, M. Y. Wang, H. Ren, X. Q. Liu, G. Zeng, and G. X. Yang 1

supplementary material for calculation details

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DOI - Is supplement to Carrier-Induced Formation of Electrically-Active Boron-Interstitial Clusters in Irradiated Boron-Doped Silicon

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Physical sciences

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carrier-induced degradation boron-interstitial clusters

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