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Supplementary Material for Constant Period Line Gratings as a Metric for Patterning Fidelity in Electron Beam Lithography

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posted on 2024-10-08, 12:08 authored by Cecilia Fasano, Fernando Cruz Aguirre, Casey DeRoo, Keri Hoadley, Jared Termini
Includes material previously included in the appendices of the main manuscript. Updated after editor feedback and converted to Word format

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    JVST B: Nanotechnology and Microelectronics

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