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posted on 2025-07-25, 12:09 authored by Sebastian Lehmann, Christiane Kranz, Angelika Wrzesinska-Lashkova, Nicolás Pérez, Dong-Ho Shin, Amin Bahrami, Yana Vaynzof, Kornelius NielschThe supplementary material contains additional XPS detail spectra for Co 2p and C 1s at varying etch times; photographs of CoOx films on silicon and silicon/silicon nitride substrates in the ALD chamber; cross-sectional/top-view SEM micrographs at different thermal-to-plasma ratios; and a table with deconvolution analysis of the Co 2p3/2 peak.
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Related Materials
- 1. DOI - Is supplement to A Supercycle Approach to Plasma-Enhanced Atomic Layer Deposition of Cobalt Oxide Films
