Supplementary Material

figure

posted on 2025-08-01, 12:11 authored by Reem Alshanbari, Takahito Imai, Yuanshen QI, Shin-ichi Yamamoto, Tai-De Li, Moshe Eizenberg, Ioannis (John) Kymissis

STEM; Selected area electron diffraction pattern

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DOI - Is supplement to Study of the interfacial reaction of high-<em>κ</em> Al<sub>2</sub>O<sub>3</sub> gate oxides with IGZO

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Physical sciences

Keywords

Al2O3; IGZO; Indium

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