Supplementary Material

https://doi.org/10.60893/figshare.jcp.28514567

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posted on 2025-03-28, 12:04 authored by Sanghun Lee, Seunggi Seo, Tae Hyun Kim, Hwi Yoon, Seonyeong Park, Seunggyu Na, Jeongwoo Seo, Soo-Hyun Kim, Seung-min Chung, Hyungjun Kim

Illustration for motivation of this work, raw data, and supporting datas

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Keywords

Area-selective atomic layer deposition Silicon oxide Silicon nitride Layer-by-layer NH3 plasma treatment Dielectric quality

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