posted on 2024-10-11, 12:06authored byAhmad Abed, Rebecca Peterson
The supplementary material contains a cross-sectional HAADF STEM image, an AFM image of a film deposited with no oxygen flux and no subsequent PDA, and GIXRD traces for films deposited with 20% and 30% O2 flux during growth and annealed at 950 oC in O2 ambient.