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posted on 2024-08-20, 12:01 authored by Shangfeng Liu, Bogdan-Petrin Ratiu, Hui Jia, Zhao Yan, Ka Ming Wong, Mickael Martin, Mingchu Tang, Thierry Baron, Huiyun Liu, Qiang Li

Supplementary Material for Effective InAsP dislocation filtering layers for InP heteroepitaxy on CMOS-standard (001) silicon

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XRD TEM

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