Supplementary Data

The supplementary material provides additional insights into the methodologies and results discussed in the main manuscript. It includes detailed illustrations and analyses, starting with Fig. S1, which outlines the fabrication methodology for MIM capacitors. Fig. S2 presents a schematic of the conduction atomic force microscopy (CAFM) setup used in our experiments. In Fig. S3, we explore the localized CAFM stressing of 12 nm mica flakes under ultra-high vacuum (UHV) conditions, while Fig. S4 extends this analysis to ambient conditions. Additionally, Table SI offers a comprehensive volume analysis of 10 samples, detailing their breakdown characteristics, the calculated energy required to cause the crater volume (𝐸req), and the estimated energy dissipated during post-breakdown (𝐸avg). Fig. S5 compares before and after AFM topographies of 9 nm mica-based nano-capacitors.