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posted on 2025-10-06, 04:13 authored by Lucía Pérez Ramírez, Tom Iung, Vineeta Yadav, Christophe LUBIN, Uwe Schroeder, Florian Wunderwald, Luis Azevedo Antunes, Alfred Kersch, Tyson Back, Conan Weiland, Mickael Gros-Jean, Nicholas Barrett
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    Journal of Applied Physics

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    ferroelectric HfO2depth-profiling,Ar+ sputteringXPSHAXPES

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