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posted on 2025-11-18, 13:09 authored by Juha Ojala, Mykhailo Chundak, Anton Vihervaara, Marko Vehkamäki, Mikko Ritala
Values of Gibbs free energy change for oxidation reactions of MoO2 to MoO3 with H2O, N2O, O2, and O3 at 0-500 {degree sign}C.

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    DOI - Is supplement to Atomic Layer Etching of Molybdenum with O<sub>2</sub> and NbCl<sub>5</sub>

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    JVST A: Vacuum, Surfaces, and Films

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    Atomic Layer EtchingMolybdenumXPS

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