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Supplement Number 1

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posted on 2025-06-13, 12:07 authored by Rukai Jiang, Xuhong Hu, Zhuokun He, Yaoze Li, Shengheng Ma, Qianyu Hou, Wenhong Sun
The supplementary material document contains the transfer characteristics, output characteristics, and breakdown characteristic curves of the double barrier p-GaN gate enhancement-mode HEMT device (Device C).

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    JVST B: Nanotechnology and Microelectronics

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