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posted on 2025-09-09, 12:08 authored by Ryusuke Seino, Hidehiro Asai, Ichiro Takakuwa, Shutaro Asanuma, Yoshihiro Nemoto, Yuki Nishimiya, Keishi Nishio, Makoto Minohara
Schematic of device structure for the simulation. The work function of the gate electrode is assumed to be 4.4 eV. Ohmic contacts are assumed to form at the source/p-type oxide and drain/a-IGZO interfaces. No specific materials are assigned to the gate, source, and drain electrodes.

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    Journal of Applied Physics

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