Supplementary Information

Name: Supplementary Information
Published: 2024-11-08T13:08:25+00:00
License: https://creativecommons.org/licenses/by/4.0/
Keywords: photoresist, molecular layer deposition, extreme ultraviolet lithography

dataset

posted on 2024-11-08, 13:08 authored by Ajay Ravi, Long Than, Jacqueline Lewis, Jingwei Shi, Andreas Werbrouck, Jingyi Han, Miika Mattinen, Stacey Bent

This file contains figures, tables, and descriptions that offer additional information to complement the main text.