Supplemental Material
dataset
posted on 2024-11-14, 13:01 authored by Christina Vantaraki, Petter Ström, Tuan Tran, Matias Grassi, Giovanni Fevola, Michael Foerster, Jerzy Sadowski, Daniel Primetzhofer, Vassilios KapaklisThe Supplementary Material includes a detailed description of the fabrication process of the Cr patterned mask. We further present details on ToF - ERDA measurements and the MOKE system.
